研究内容

Research Interests

最近のプロジェクト [English]

1) シンクロトロン放射光・レーザー光励起による弱相互作用系の電子状態計測法開拓


2) 機能性分子薄膜の光電子放出強度の理論解析と分子軌道撮影法の開発


3) 有機半導体薄膜の電荷輸送機構の研究


4) 有機半導体薄膜の界面電子準位接合機構の研究


5) 機能性分子薄膜の振動状態計測と励起子生成・拡散・再結合の研究


6) 分子双極子および分子四重極子のつくる局所ポテンシャルの電子状態や準位接合への影響


7) 自己組織化と分子認識機能の分光研究


8) 分子薄膜の作製と評価：成長ダイナミクス、構造と分子配向


Methods and Equipments

Laboratory works:

High-sensitive ultraviolet photoelectron spectroscopy (HSUPS): A1 machine
Angle-resolved ultraviolet photoelectron spectroscopy (ARUPS): D2 machine
Gas-phase ultraviolet photoelectron spectroscopy (gas UPS): G3 machine
Deflector-based angle-resolved ultraviolet photoelectron spectroscopy (2D-ARUPS): DA30 machine
Metastable atom electron spectroscopy (MAES, PIES)
X-ray photoelectron spectroscopy (XPS)
Inverse photoelectron spectroscopy (IPES)
Low-energy inverse photoelectron spectroscopy (LEIPS)
Spot-profile analysis low energy electron diffraction (SPALEED)
Multi-channel plate low energy electron diffraction (MCPLEED)
Two-photon photoemission spectroscopy (2PPE)
Time-resolved photoelectron spectroscopy (TRPES)
First-principles calculation (Gaussian, VASP)



Synchrotron based techniques:
Photoelectron momentum microscope (PMM): BL6U(UVSOR)
Aceptance-cone-tunable electron spectrometer (ACTES): BL6U(UVSOR)
Low-energy angle-resolved ultraviolet photoelectron spectroscopy (LE-ARUPS): BL7U(UVSOR)
high-resolution x-ray photoelectron spectroscopy (XPS)
Resonance auger photoelectron spectroscopy (RPES)
Near-edge x-ray absorption fine structure spectroscopy (NEXAFS)
X-ray standing wave spectroscopy (XSW)
Angle-resolved time-of-flight spectroscopy (ArTOF): BESSY
Momentum-resolved photoelectron emission microscopy (nano ESCA): ELETTRA


Collaboration works:
Two-photon photoemission spectroscopy (2PPE)
Scanning tunnel microscopy/spectroscopy (STM/STS)
Photoelectron (low energy electron) emission microscopy (PEEM/LEEM)
High-resolution electron energy loss spectroscopy (HREELS)
First-principle calculation of functional molecules at surface and interface